Manufacturer:
Veeco
Model:
ME 1001 Ion Beam Milling System
Description:
Argon plasma ion beam milling system for microelectronics patterning. Water-cooled substrate holder up to 200mm wafer sizes.
Veeco Ion Beam Milling System
Veeco
ME 1001 Ion Beam Milling System
Argon plasma ion beam milling system for microelectronics patterning. Water-cooled substrate holder up to 200mm wafer sizes.