Manufacturer:
Oxford Instruments
Model:
PlasmaLab System 100
Description
Reactive ion etching (RIE) using fluorine based gases. 100mm tooling with load lock.
List of process capabilities
- BOSCH etch
- Silicon Nitride Etch (Si3N4)
- Silicon Cryo-etch (Si)
- Silicon Dioxide Etch (SiO2)
- Metal Etch